Okamoto, K; Prell, Warren L; Gardner, James V (2005): Major-element chemical analyses of Hole 68-501 [dataset]. PANGAEA, https://doi.org/10.1594/PANGAEA.262514
Always quote citation above when using data! You can download the citation in several formats below.
Related to:
DSDP (1989): Data from the Deep Sea Drilling Project. Sediment, hard rock and reference files. National Geophysical Data Center, National Environmental Satellite, Data and Information Service, National Oceanic and Atmospheric Administration, U.S. Department of Commerce, 1, CD-ROM
Zimmerman, Herman; Spariosu, Dann J; Sancetta, Constance A; Riedel, William R; Mayer, Larry A; Mann, Ulrich; Ledbetter, Michael T; Kent, Dennis V; Keigwin, Lloyd D; Fleet, A J; Blechschmidt, G; Adelseck, C; Prell, Warren L; Gardner, James V (1982): Initial Reports of the Deep Sea Drilling Project. Initial Reports of the Deep Sea Drilling Project, U.S. Government Printing Office, LXVIII, 495 pp, https://doi.org/10.2973/dsdp.proc.68.1982
Further details:
Project(s):
Deep Sea Drilling Project (DSDP)
Coverage:
Latitude: 1.227200 * Longitude: -83.734300
Date/Time Start: 1979-07-08T00:00:00 * Date/Time End: 1979-07-08T00:00:00
Minimum DEPTH, sediment/rock: 264.19 m * Maximum DEPTH, sediment/rock: 333.90 m
Event(s):
68-501 * Latitude: 1.227200 * Longitude: -83.734300 * Date/Time: 1979-07-08T00:00:00 * Elevation: -3457.0 m * Penetration: 337.1 m * Recovery: 70.5 m * Location: North Pacific/FLANK * Campaign: Leg68 * Basis: Glomar Challenger * Method/Device: Drilling/drill rig (DRILL) * Comment: 19 cores; 137.7 m cored; 0.5 m drilled; 51.2 % recovery
Parameter(s):
| # | Name | Short Name | Unit | Principal Investigator | Method/Device | Comment |
|---|---|---|---|---|---|---|
| 1 | DEPTH, sediment/rock | Depth sed | m | Geocode | ||
| 2 | Sample code/label | Sample label | Okamoto, K | DSDP/ODP/IODP sample designation | ||
| 3 | Sample ID | Sample ID | Okamoto, K | |||
| 4 | Alteration | Alteration | Okamoto, K | |||
| 5 | Rock type | Rock | Okamoto, K | |||
| 6 | Lithology/composition/facies | Lithology | Okamoto, K | |||
| 7 | Silicon dioxide | SiO2 | % | Okamoto, K | ||
| 8 | Aluminium oxide | Al2O3 | % | Okamoto, K | ||
| 9 | Iron oxide, FeO | FeO | % | Okamoto, K | given as FeO, total [%] | |
| 10 | Magnesium oxide | MgO | % | Okamoto, K | ||
| 11 | Calcium oxide | CaO | % | Okamoto, K | ||
| 12 | Sodium oxide | Na2O | % | Okamoto, K | ||
| 13 | Potassium oxide | K2O | % | Okamoto, K | ||
| 14 | Titanium dioxide | TiO2 | % | Okamoto, K | ||
| 15 | Phosphorus pentoxide | P2O5 | % | Okamoto, K | ||
| 16 | Sample method | Sample method | Okamoto, K | |||
| 17 | Method comment | Method comm | Okamoto, K | |||
| 18 | Comment | Comment | Okamoto, K |
License:
Creative Commons Attribution 3.0 Unported (CC-BY-3.0)
Size:
119 data points
Data
| 1 Depth sed [m] | 2 Sample label | 3 Sample ID | 4 Alteration | 5 Rock | 6 Lithology | 7 SiO2 [%] | 8 Al2O3 [%] | 9 FeO [%] | 10 MgO [%] | 11 CaO [%] | 12 Na2O [%] | 13 K2O [%] | 14 TiO2 [%] | 15 P2O5 [%] | 16 Sample method | 17 Method comm | 18 Comment |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| 264.19 | 68-501-10-1,9-0 | 1 | Moderately altered | Igneous | BASALTIC GLASS | 51.44 | 14.26 | 10.79 | 7.36 | 12.36 | 2.07 | 0.04 | 1.14 | 0.10 | PR | FTTTFTT FF1FFF | APHYRIC BASALT |
| 268.18 | 68-501-11-1,88-0 | 49 | Moderately altered | Igneous | BASALTIC GLASS | 51.12 | 14.28 | 10.74 | 7.59 | 12.26 | 2.05 | 0.05 | 1.11 | 0.10 | PR | FTTTFTT FF1FFF | APHYRIC BASALT |
| 287.43 | 68-501-14-3,133-0 | 188 | Moderately altered | Igneous | BASALTIC GLASS | 51.23 | 15.00 | 9.47 | 8.23 | 12.88 | 1.92 | 0.02 | 1.00 | 0.08 | PR | FTTTFTT FF1FFF | PLAG-OL PHYRIC BASALT |
| 292.86 | 68-501-15-1,76-0 | 208 | Slightly altered | Igneous | BASALTIC GLASS | 50.98 | 15.16 | 9.27 | 8.30 | 12.87 | 1.87 | 0.03 | 0.98 | 0.09 | PR | FTTTFTT FF1FFF | PLAG SPARSELY TO MODERATELY PHYRIC BASALT |
| 296.57 | 68-501-15-3,147-0 | 249 | Moderately altered | Igneous | BASALTIC GLASS | 51.20 | 15.25 | 9.32 | 8.23 | 12.89 | 1.96 | 0.03 | 0.97 | 0.08 | PR | FTTTFTT FF1FFF | PLAG SPARSELY TO MODERATELY PHYRIC BASALT |
| 329.80 | 68-501-20-2,20-0 | 427 | Extensively altered | Igneous | BASALTIC GLASS | 51.25 | 14.44 | 10.55 | 7.64 | 12.66 | 1.92 | 0.03 | 1.04 | 0.09 | PR | FTTTFTT FF1FFF | PLAG-OL-CPX SPARSELY PHYRIC BASALT |
| 333.90 | 68-501-20-4,130-0 | 481 | Moderately altered | Igneous | BASALTIC GLASS | 50.29 | 14.90 | 9.54 | 8.32 | 13.18 | 1.91 | 0.04 | 0.93 | 0.09 | PR | FTTTFTT FF1FFF | PLAG-OL PHYRIC BASALT |